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ЖУРНАЛЫ // Физика и техника полупроводников // Архив

Физика и техника полупроводников, 2017, том 51, выпуск 12, страницы 1698–1705 (Mi phts5978)

Эта публикация цитируется в 1 статье

Физика полупроводниковых приборов

Electrical properties and the determination of interface state density from $I$$V$, $C$$f$ and $G$$f$ measurements in Ir/Ru/$n$-InGaN Schottky barrier diode

R. Padma, V. Rajagopal Reddy

Department of Physics, Sri Venkateswara University, India

Аннотация: The electrical properties of the Ir/Ru Schottky contacts on $n$-InGaN have been investigated by current-voltage ($I$$V$), capacitance-voltage ($C$$V$), capacitance-frequency ($C$$f$) and conductance-frequency ($C$$f$) measurements. The obtained mean barrier height and ideality factor from $I$$V$ are 0.61 eV and 1.89. The built-in potential, doping concentration and barrier height values are also estimated from the $C$$V$ measurements and the corresponding values are 0.62 V, 1.20 $\times$ 10$^{17}$ cm$^{-3}$ and 0.79 eV, respectively. The interface state density $(N_{SS})$ obtained from forward bias $I$$V$ characteristics by considering the series resistance $(R_{S})$ values are lower without considering the series resistance $(R_{S})$. Furthermore, the interface state density $(N_{SS})$ and relaxation time $(\tau)$ are also calculated from the experimental $C$$f$ and $G$$f$ measurements. The $N_{SS}$ values obtained from the $I$$V$ characteristics are almost three orders higher than the $N_{SS}$ values obtained from the $C$$f$ and $G$$f$ measurements. The experimental results depict that $N_{SS}$ and $\tau$ are decreased with bias voltage. The frequency dependence of the series resistance $(R_{S})$ is attributed to the particular distribution density of interface states.

Поступила в редакцию: 24.06.2016
Исправленный вариант: 27.02.2017

Язык публикации: английский

DOI: 10.21883/FTP.2017.12.45189.8340


 Англоязычная версия: Semiconductors, 2017, 51:12, 1641–1649

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