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ЖУРНАЛЫ // Физика и техника полупроводников // Архив

Физика и техника полупроводников, 2020, том 54, выпуск 12, страница 1374 (Mi phts6681)

Эта публикация цитируется в 3 статьях

Физика полупроводниковых приборов

Analytical drain current modeling and simulation of triple material gate-all-around heterojunction TFETs considering depletion regions

C. Usha, P. Vimala

Department of Electronics and Communication, Dayananda Sagar College of Engineering, Bangalore, Karnataka, India

Аннотация: This paper deals with electrostatic behavior of triple-material gate-all-around hetero-junction tunneling field-effect transistors (TMGAA-HJTFET) device. The model is advantageous in apprehending a comparative study with the single-material gate-all-around hetero-junction tunneling field-effect transistors (SMGAA-HJTFET) in terms of surface potential, electric field, drain current, transconductance, and threshold voltage. The surface-potential distribution in partition regions along the channel is solved by using two-dimensional Poisson’s equation. By using the drift and diffusion current, drain current is derived, and $I_{\operatorname{On}}/I_{\operatorname{Off}}$ ratio of 10$^{11}$ is gained from analytical modeling and TCAD simulation. Transconductance and threshold voltage are derived from the tunneling current. The proposed model results are validated by the ATLAS TCAD simulation tool.

Ключевые слова: drain current, surface potential, electric field, TFETs, TCAD simulation.

Поступила в редакцию: 11.05.2020
Исправленный вариант: 07.07.2020
Принята в печать: 13.08.2020

Язык публикации: английский


 Англоязычная версия: Semiconductors, 2020, 54:12, 1634–1640


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