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JOURNALS // Chemical Physics and Mesoscopics // Archive

CPM, 2016 Volume 18, Issue 3, Pages 349–360 (Mi chphm286)

About the structure of deposited Zn-S nanofilms on substrates of aluminum oxide

A. V. Vakhrouchevab, A. Y. Fedotova, A. V. Severyukhina, R. G. Valeevc

a Institute of Mechanics, Ural Branch of the Russian Academy of Science, Izhevsk, Russia
b Kalashnikov Izhevsk State Technical University, Izhevsk, Russia
c Physical-Technical Institute, Ural Branch of the Russian Academy of Science, Izhevsk, Russia

Abstract: The porous anodic aluminum oxide is widely used as templates for the synthesis of nanostructures of various kinds, thanks to the orderly arrangement of hexagonally-oriented vertically to the surface of the film then. This makes it possible to form ordered arrays of semiconductor nanostructures phosphor same size and shape to each nanoobject present as a separate light emitter. The addition of coherent radiation from all sources results in a substantial increase in light inte sity. The aim of work is to study the structure of the nanofilm coating and the substrate during epitaxial deposition. Often the nature of the structure of objects that determines their properties, changes the optical, electrical, and physical-mechanical parameters. Theoretical studies were carried out using molecular dynamics. As the potential was used Lennard-Jones potential. The temperature and pressure in nanosystems were maintained by a thermostat and barostat Nose-Hoover-a. Periodic boundary conditions are used. The velocity field at the initial time was selected according to the Maxwell distribution in the form of nanosized elements. Silting substrate was carried out as uniform deposition of atoms on the normal to the substrate. Deposited atoms is added to the stage for overgrowth in the area above the substrate. Zinc and sulfur atoms are considered as deposited atoms. Adding copper atoms a 5 % was carried out in some cases. Its position on the substrate was determined by a uniform random distribution law. The amount of added atoms per unit time and the total number were manageable process parameters. The initial rate was constant for the deposited atoms. Speed settings are only changed in the interaction with the substrate deposited atoms. To carry out theoretical research the software package for parallel computing processes LAMMPS is used. In the analysis of the structure considered as a substrate of aluminum oxide (solid and porous), and the deposited zinc, sulfur, and copper. In all cases, the materials were amorphous structure.

Keywords: LAMMPS, epitaxy, nanofilms, simulation, LAMMPS, crystal structure, molecular dynamics.

UDC: 539.216+539.231



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