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JOURNALS // Computational nanotechnology // Archive

Comp. nanotechnol., 2020 Volume 7, Issue 4, Pages 68–71 (Mi cn322)

LETTERS TO THE EDITOR

Mathematical modeling of the diffusion process of a semiconductor detector

R. A. Muminova, Y. Q. Toshmurodovb, G. J. Ergasheva, M. O. Yavqochdiyevb

a Institute of Materials Science, SPA “Physics-Sun”, Academy of Science of Uzbekistan
b Karshi branch of the Tashkent Institute of Irrigation and Agricultural Mechanization Engineers

Abstract: The article considers mathematical modeling of the technological process of drift of coordinate-sensitive detectors based on silicon with nuclear radiation, the sensor size of which is $50 \times 50 \times 1.5$ mm and $8$ bands, and compares them.

Keywords: diffusion, drift, surface concentration, diffusion, activation, energy.

UDC: 621.376.234

Received: 15.11.2020

DOI: 10.33693/2313-223X-2020-7-4-68-71



© Steklov Math. Inst. of RAS, 2024