Semiconductors
Investigation of the interlayer surface of $p$-Bi$_{2-x}$Sb$_x$Te$_3$ films of topological thermoelectrics by scanning tunneling spectroscopy and microscopy
L. N. Luk'yanova,
I. V. Makarenko,
O. A. Usov,
V. A. Danilov Ioffe Institute, St. Petersburg, Russia
Abstract:
The morphology of the interlayer van der Waals surface (0001) has been investigated by scanning tunneling microscopy in layered films of topological insulators
$p$-Bi
$_{0.5}$Sb
$_{1.5}$Te
$_3$ and
$p$-Bi
$_2$Te
$_3$ prepared by discrete evaporation. A systematization of the impurity and intrinsic defects arising in the film formation process were fulfilled. It is found that in the film of
$p$-Bi
$_{0.5}$Sb
$_{1.5}$Te
$_3$ solid solution with low thermal conductivity, the density of tellurium vacancies
$V_\mathrm{Te}$ and the height distortions in the distribution of Te (1) atoms on the (0001) surface increase compared to
$p$-Bi
$_2$Te
$_3$. Local characteristics of the surface electronic states of the Dirac fermions were determined by scanning tunneling spectroscopy. The Dirac point
$E_D$ shifts to the top of the valence band in the
$p$-Bi
$_{0.5}$Sb
$_{1.5}$Te
$_3$ film with high thermoelectric figure of merit. Despite the fact that the bulk films under investigation exhibit
$p$-type conductivity, electrons are found on the surface of the films, as the Fermi level
$V_{\mathrm{Te}}$ is located above the Dirac point
$E_D$. Fluctuations of the Dirac point energy
$\Delta E_D/\langle E_D\rangle$, the valence band edge
$\Delta E_V/\langle E_V\rangle$, and the energy of the surface defect levels
$E_p$ in
$p$-Bi
$_{0.5}$Sb
$_{1.5}$Te
$_3$ films are reduced compared to
$p$-Bi
$_2$Te
$_3$ films due to the variation of the density of states on the (0001) surface. The obtained values of the energy gap
$E_g$ in the studied films is higher than estimated by optical data due to the inversion the edges of the valence and conduction bands in topological insulators.
Keywords:
bismuth and antimony chalcogenides, layered films, surface defects, surface fermion concentration, topological insulator. Received: 11.04.2024
Revised: 12.05.2024
Accepted: 17.06.2024
DOI:
10.61011/PSS.2024.08.59047.86