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Fizika Tverdogo Tela, 2024 Volume 66, Issue 8, Pages 1318–1324 (Mi ftt10395)

Semiconductors

Investigation of the interlayer surface of $p$-Bi$_{2-x}$Sb$_x$Te$_3$ films of topological thermoelectrics by scanning tunneling spectroscopy and microscopy

L. N. Luk'yanova, I. V. Makarenko, O. A. Usov, V. A. Danilov

Ioffe Institute, St. Petersburg, Russia

Abstract: The morphology of the interlayer van der Waals surface (0001) has been investigated by scanning tunneling microscopy in layered films of topological insulators $p$-Bi$_{0.5}$Sb$_{1.5}$Te$_3$ and $p$-Bi$_2$Te$_3$ prepared by discrete evaporation. A systematization of the impurity and intrinsic defects arising in the film formation process were fulfilled. It is found that in the film of $p$-Bi$_{0.5}$Sb$_{1.5}$Te$_3$ solid solution with low thermal conductivity, the density of tellurium vacancies $V_\mathrm{Te}$ and the height distortions in the distribution of Te (1) atoms on the (0001) surface increase compared to $p$-Bi$_2$Te$_3$. Local characteristics of the surface electronic states of the Dirac fermions were determined by scanning tunneling spectroscopy. The Dirac point $E_D$ shifts to the top of the valence band in the $p$-Bi$_{0.5}$Sb$_{1.5}$Te$_3$ film with high thermoelectric figure of merit. Despite the fact that the bulk films under investigation exhibit $p$-type conductivity, electrons are found on the surface of the films, as the Fermi level $V_{\mathrm{Te}}$ is located above the Dirac point $E_D$. Fluctuations of the Dirac point energy $\Delta E_D/\langle E_D\rangle$, the valence band edge $\Delta E_V/\langle E_V\rangle$, and the energy of the surface defect levels $E_p$ in $p$-Bi$_{0.5}$Sb$_{1.5}$Te$_3$ films are reduced compared to $p$-Bi$_2$Te$_3$ films due to the variation of the density of states on the (0001) surface. The obtained values of the energy gap $E_g$ in the studied films is higher than estimated by optical data due to the inversion the edges of the valence and conduction bands in topological insulators.

Keywords: bismuth and antimony chalcogenides, layered films, surface defects, surface fermion concentration, topological insulator.

Received: 11.04.2024
Revised: 12.05.2024
Accepted: 17.06.2024

DOI: 10.61011/PSS.2024.08.59047.86



© Steklov Math. Inst. of RAS, 2025