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Fizika Tverdogo Tela, 2024 Volume 66, Issue 11, Pages 1871–1878 (Mi ftt10472)

Semiconductors

Photoelectric properties of structures with GeSiSn|Ge multiple quantum wells and relaxed GeSiSn layers

V. A. Timofeeva, I. V. Skvortsova, V. I. Mashanova, A. A. Bloshkina, V. V. Kirienkoa, I. D. Loshkareva, T. M. Zalyalovab, T. V. Perevalova, D. R. Islamovab

a Rzhanov Institute of Semiconductor Physics, Siberian Branch of Russian Academy of Sciences, Novosibirsk, Russia
b Novosibirsk State University, Novosibirsk, Russia

Abstract: The photoelectric properties of $p$-$i$-$n$ photodiodes including GeSiSn|Ge multiple quantum wells (MQWs) and relaxed GeSiSn layers on a Ge(1 0 0) substrate have been studied. Based on current-voltage characteristic measurements, it is shown that the lowest density of the dark current of $p$-$i$-$n$ photodiodes with a reverse bias of 1V reaches a value of 0.7 mA/cm$^2$. The cut-off wavelength for both diodes with MQWs and relaxed layers is about 2$\mu$m ($\sim$ 0.6 eV).

Keywords: molecular beam epitaxy, multiple quantum wells, relaxed layer, diffraction reflection curve, photodiode, photocurrent, dark current, sensitivity limit.

Received: 04.10.2024
Revised: 13.10.2024
Accepted: 13.10.2024

DOI: 10.61011/FTT.2024.11.59320.255



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