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Fizika Tverdogo Tela, 1992 Volume 34, Issue 5, Pages 1465–1472 (Mi ftt7493)
On tunneling through the interfacial ($19$–$50$ A thick) oxide layer of silicon SIS structures

S. K. Boitsov, T. L. Makarova, V. Yu. Osipov

Television Research Institute, St. Petersburg

UDC: 621.315.592+621.382.323

Received: 01.11.1991



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