Creation of thin films of NbN at room temperature of the substrate

Thin NbN films were prepared by magnetron sputtering. The films were prepared on sapphire substrates at temperatures of 20–300$^\circ$C. Superconducting transition temperature for different samples, depending on the substrate temperature during deposition was 8–14 K. The density of the critical current jc lies in the range of 0.8–8 MA/cm$^2$, which allows the usage of these films for creation of multilayer structures, due to the absence of annealing, to which each underlying layer with structures is exposed when sputtered next.