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Fizika Tverdogo Tela, 2020 Volume 62, Issue 11, Pages 1943–1948 (Mi ftt8266)

Surface physics, thin films

Quantum mechanical approach for determining the activation energy of surface diffusion

È. F. Shtapenko, V. V. Tytarenko, V. A. Zabludovsky, E. O. Voronkov

Dnepropetrovsk National University of Railway Transport

Abstract: A quantum-mechanical approach is proposed for determining the activation energy of surface diffusion for adsorbed atoms of copper, nickel, zinc and iron on a copper substrate during electrocrystallization for various substrate overpotential. The calculation of the activation energy of surface diffusion is performed through the total energy of the crystal. An increase in the activation energy of surface diffusion with an increase in the surface potential is associated with an increase in the binding energy of the ad-atom with the substrate.

Keywords: activation energy of surface diffusion, ad-atom, electrocrystallization, overpotential.

Received: 18.06.2020
Revised: 18.06.2020
Accepted: 22.06.2020

DOI: 10.21883/FTT.2020.11.50074.129


 English version:
Physics of the Solid State, 2020, 62:11, 2191–2196

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© Steklov Math. Inst. of RAS, 2024