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JOURNALS // Fizika Tverdogo Tela // Archive

Fizika Tverdogo Tela, 2020 Volume 62, Issue 10, Pages 1618–1626 (Mi ftt8282)

This article is cited in 1 paper

Semiconductors

Electronic structure of an ultrathin molybdenum oxide film

P. A. Dementeva, E. V. Ivanovaa, M. N. Lapushkina, D. A. Smirnovb, S. N. Timoshnevc

a Ioffe Institute, St. Petersburg
b Institut für Festkörper- und Materialphysik, Technische Universität Dresden, Germany
c Alferov Federal State Budgetary Institution of Higher Education and Science Saint Petersburg National Research Academic University of the Russian Academy of Sciences, St. Petersburg

Abstract: The electronic structure of an ultra-thin molybdenum oxide film obtained by oxidation of molybdenum at an oxygen pressure of 1 Torr and the effect of adsorption of sodium atoms Na on its electronic structure are studied by ultra-vacuum photoelectron spectroscopy in ultrahigh vacuum. Photoemission spectra from the valence band and core levels of O $2s$, Mo $3d$ Mo $3p$, and Na $1p$ are studied, upon synchrotron excitation in the photon energy range 80 – 600 eV. It is shown that in the formed oxide film, molybdenum is in two states: Mo$^{6+}$ and Mo$^{4+}$. On the surface of the oxide, oxygen is induced both in the composition of the oxides and in hydroxyl. It was shown that MoO$_3$ is formed on the surface, and MoO$_2$ at a distance from the surface. The deposition of Na atoms leads to intercalation of the molybdenum oxide layer.

Keywords: molybdenum oxides, photoemission, sodium, intercalation.

Received: 04.06.2020
Revised: 04.06.2020
Accepted: 04.06.2020

DOI: 10.21883/FTT.2020.10.49906.121


 English version:
Physics of the Solid State, 2020, 62:10, 1787–1795

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© Steklov Math. Inst. of RAS, 2024