Abstract:
Thin carbon films prepared by pulsed plasma ion-assisted deposition of graphite in an atmosphere of a mixture of argon and nitrogen are studied. The results of characteristic electron energy loss spectroscopy and electron diffraction indicate the increase in the graphite component with increasing ion assistance energy. The use of ion assistance during the film deposition makes it possible to control their resistivity by changing it from 10$^5$ to 10$^{2}$$\Omega$ cm.
Keywords:ion-plasma deposition, thin films, amorphous carbon, transmission electron microscopy, electron energy loss spectroscopy, specific resistivity.