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Fizika Tverdogo Tela, 2018 Volume 60, Issue 1, Pages 22–24 (Mi ftt9322)

Semiconductors

Interaction between antimony atoms and micropores in silicon

V. B. Odzaeva, A. N. Pyatlitskib, V. I. Plebanovichc, P. K. Sadovskiia, M. I. Tarasika, A. R. Chelyadinskiia

a Belarusian State University, Minsk
b Integral, Minsk, Republic of Belarus
c Planar Joint Stock Company, Minsk, Republic of Belarus

Abstract: The interaction between Sb atoms and micropores of a getter layer in silicon is studied. The getter layer was obtained via implantation of Sb$^+$ ions into silicon and subsequent heat treatment processes. The antimony atoms located in the vicinity of micropores are captured by micropores during gettering annealing and lose its electrical activity. The activation energy of capture process to the pores for antimony is lower than that of antimony diffusion in silicon deformation fields around microvoids on the diffusion process.

Received: 11.04.2017

DOI: 10.21883/FTT.2018.01.45283.123


 English version:
Physics of the Solid State, 2018, 60:1, 20–22

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© Steklov Math. Inst. of RAS, 2024