Abstract:
Laser annealing experiments were performed in order to increase the concentration of electrically active manganese in the layers of A$^{3}$B$^{5}$: Mn semiconductors. An LPX-200 KrF excimer laser with a wavelength of 248 nm and a pulse duration of $\sim$30 ns was used. It is shown experimentally that at a pulse energy of an excimer laser of $>$ 230 mJ/cm$^2$, the hole concentration in GaAs: Mn layers increases to 3 $\times$ 10$^{20}$ cm$^{-3}$. The negative magnetoresistance and the anomalous Hall effect with a hysteresis loop for annealed GaAs: Mn samples remain the same up to 80–100 K. Similar changes are observed for InAs: Mn layers as a result of laser annealing.