Micromagnetic structure of the domain wall with Bloch lines in an electric field

The micromagnetic structure of the domain wall (DW) with periodically distributed horizontal Bloch lines in a ferromagnetic film in an external electric field has been studied. The effect of the electric field on the internal DW micromagnetic structure is caused by inhomogeneous magnetoelectric coupling. Possible scenarios of the DW internal structure transformations implemented with varying the electric fields strength have been analyzed in detail. For each scenario, static characteristics of the system, such as the energy, DW profile, DW effective thickness, and electric polarization have been calculated.