Abstract:
Films of composites (Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$(Al$_{2}$ O$_{3}$)$_{100-x}$, (Co$_{84}$Nb$_{14}$Ta$_{2}$)$_{x}$(SiO$_{2}$)$_{100-x}$, (Co$_{41}$Fe$_{39}$B$_{20}$)$_{x}$(SiO$_{2}$)$_{100-x}$ and multilayer heterogeneous composite–composite structures $\{$[(Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$(Al$_{2}$ O$_{3}$)$_{100-x}$] / [(Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$ (Al$_{2}$O$_{3}$)$_{100-x}$+N$_{2}]\}_{n}$, $\{$[(Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$(Al$_{2}$ O$_{3}$)$_{100-x}$] / [(Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$ (Al$_{2}$O$_{3}$)$_{100-x}$ + Î$_{2}]\}_{n}$, $\{$[(Co$_{41}$Fe$_{39}$B$_{20}$)$_{x}$(SiO$_{2}$)$_{100-x}$] / [(Co$_{41}$Fe$_{39}$B$_{20}$)$_{x}$(SiO$_{2}$)$_{100-x}$ + Î$_{2}]\}_{n}$, and $\{$[(Co$_{84}$Nb$_{14}$Ta$_{2}$)$_{x}$(SiO$_{2}$)$_{100-x}$] / [(Co$_{84}$Nb$_{14}$Ta$_{2}$)$_{x}$ (SiO$_{2}$)$_{100-x}$+Î$_{2}]\}_{n}$ have been deposited using the ionbeam sputtering method with a cyclic supply of reaction gases during deposition. The structure and magnetic properties of the films have been studied. It has been shown that the introduction of an oxidized interlayer makes it possible to suppress the perpendicular magnetic anisotropy in the (Co$_{45}$Fe$_{45}$Zr$_{10}$)$_{x}$(Al$_{2}$ O$_{3}$)$_{100-x}$ composite with the metallic phase concentration higher than the percolation threshold.