A. A. Bykov, E. G. Mozulev, A. K. Kalagin, “Resonance microwave photoresistance of a two-subband electron system at large filling factors”, Pis'ma v Zh. Èksper. Teoret. Fiz., 2010, Volume 92, Issue 6,Pages <nobr>420

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Pis'ma v Zh. Èksper. Teoret. Fiz., 2010 Volume 92, Issue 6, Pages 420–423 (Mi jetpl1418)

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CONDENSED MATTER

Resonance microwave photoresistance of a two-subband electron system at large filling factors

A. A. Bykov^a, E. G. Mozulev^b, A. K. Kalagin^a

^a Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, Russia
^b Novosibirsk State University, Novosibirsk, Russia

Received: 04.08.2010

English version: Journal of Experimental and Theoretical Physics Letters, 2010, 92:6, 379–382

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