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JOURNALS // Journal of Siberian Federal University. Mathematics & Physics // Archive

J. Sib. Fed. Univ. Math. Phys., 2016 Volume 9, Issue 4, Pages 524–527 (Mi jsfu515)

This article is cited in 4 papers

Micromagnetic simulation of magnetization reversal processes in thin obliquely deposited films

Platon N. Solovevab, Andrey V. Izotovab, Boris A. Belyaevab

a Kirensky Institute of Physics SB RAS, Akademgorodok, 50/38, Krasnoyarsk, 660036
b Institute of Engineering Physics and Radio Electronics, Siberian Federal University, Svobodny, 79, Krasnoyarsk, 660041, Russia

Abstract: The magnetization reversal processes in thin obliquely deposited films were studied by means of micromagnetic modeling. Thin film structures for micromagnetic study were generated by Monte Carlo film growth simulator. Using obtained hysteresis loops for the generated films, we retrieved coercivity and remanent magnetization as a function of the deposition angle $\alpha$. The results showed that for films with $\alpha < 65^\circ$ the magnetization reversal occurred via coherent rotation of magnetic moments, whereas samples generated with larger deposition angles reverse their magnetization by the formation of complex quasi-domain magnetic structures. The numerical results are in a good accordance with the previously reported experimental measurements.

Keywords: film growth simulation, hysteresis loops, micromagnetic simulation, oblique deposition.

UDC: 537.622

Received: 20.08.2016
Received in revised form: 10.10.2016
Accepted: 07.11.2016

Language: English

DOI: 10.17516/1997-1397-2016-9-4-524-527



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