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JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive

Zhurnal Tekhnicheskoi Fiziki, 1985 Volume 55, Issue 5, Pages 979–980 (Mi jtf1269)

Brief Communications

STABILITY OF AMORPHOUS-SILICON DIOXIDE AFTER THE NEUTRON RADIATION OR AFTER THE BARIC EFFECT

L. M. Landa, V. V. Bolshakov, L. V. Zabolotskiy, V. A. Klyuchnikov

Kemerovo State University

UDC: 539.213

Received: 12.07.1984



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