RUS
ENG
Full version
JOURNALS
// Zhurnal Tekhnicheskoi Fiziki
// Archive
Zhurnal Tekhnicheskoi Fiziki,
1985
Volume 55,
Issue 5,
Pages
979–980
(Mi jtf1269)
Brief Communications
STABILITY OF AMORPHOUS-SILICON DIOXIDE AFTER THE NEUTRON RADIATION OR AFTER THE BARIC EFFECT
L. M. Landa
,
V. V. Bolshakov
,
L. V. Zabolotskiy
,
V. A. Klyuchnikov
Kemerovo State University
UDC:
539.213
Received:
12.07.1984
Fulltext:
PDF file (309 kB)
Bibliographic databases:
©
Steklov Math. Inst. of RAS
, 2024