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// Zhurnal Tekhnicheskoi Fiziki
// Archive
Zhurnal Tekhnicheskoi Fiziki,
1986
Volume 56,
Issue 7,
Pages
1329–1335
(Mi jtf273)
Plasma
MECHANISM OF THE POLYMER FILM ETCHING IN THE LOW-TEMPERATURE PLASMA
K. A. Valiev
,
T. M. Makhviladze
,
M. E. Sarychev
General Physics Institute of the Academy of Sciences of the USSR, Moscow
UDC:
533.9.01+621.382.8
Received:
18.06.1985
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Steklov Math. Inst. of RAS
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