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JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive

Zhurnal Tekhnicheskoi Fiziki, 1986 Volume 56, Issue 7, Pages 1329–1335 (Mi jtf273)

Plasma

MECHANISM OF THE POLYMER FILM ETCHING IN THE LOW-TEMPERATURE PLASMA

K. A. Valiev, T. M. Makhviladze, M. E. Sarychev

General Physics Institute of the Academy of Sciences of the USSR, Moscow

UDC: 533.9.01+621.382.8

Received: 18.06.1985



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