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JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive
Zhurnal Tekhnicheskoi Fiziki, 1991 Volume 61, Issue 3, Pages 183–186 (Mi jtf4217)
Brief Communications

NUMERICAL MODELING OF DYNAMICS OF NANOSECOND LASER ANNEALING OF IMPLANTED SILICON

S. P. Zhvavyi, O. L. Sadovskaya




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