Zhurnal Tekhnicheskoi Fiziki, 1991 Volume 61, Issue 6, Pages 37–44
(Mi jtf4286)
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Gas Discharges, Plasmas
HIGH-FREQUENCY DISCHARGE IN HELIUM USED FOR PLASMA-CHEMICAL PLATING OF
SEMICONDUCTING-FILMS FROM ORGANOMETALLIC COMPOUNDS
T. I. Benyushis, M. I. Vasilevskii, B. V. Gurylev, S. N. Ershov, A. B. Ozerov
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