RUS  ENG
Full version
JOURNALS // Zhurnal Tekhnicheskoi Fiziki // Archive

Zhurnal Tekhnicheskoi Fiziki, 1991 Volume 61, Issue 6, Pages 37–44 (Mi jtf4286)

Gas Discharges, Plasmas

HIGH-FREQUENCY DISCHARGE IN HELIUM USED FOR PLASMA-CHEMICAL PLATING OF SEMICONDUCTING-FILMS FROM ORGANOMETALLIC COMPOUNDS

T. I. Benyushis, M. I. Vasilevskii, B. V. Gurylev, S. N. Ershov, A. B. Ozerov




Bibliographic databases:


© Steklov Math. Inst. of RAS, 2025