Abstract:
A new method for the formation of three-dimensional quantum-dimensional InGaP(As) islands is proposed, which consists in replacing phosphorus with arsenic in an InGaP layer deposited on GaAs directly during epitaxial growth. It is shown that the replacement of phosphorus with arsenic results in formation of three-dimensional islands in the thin InGaP layer. At room temperature, these islands emit light in the spectral range of 0.95 – 0.97 $\mu$m. The estimated density of the islands is 1.3 $\times$ 10$^{10}$ cm$^{-2}$.