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Zhurnal Tekhnicheskoi Fiziki, 2020 Volume 90, Issue 11, Pages 1838–1842 (Mi jtf5149)

This article is cited in 4 papers

XXIV International Symposium Nanophysics and Nanoelectronics, Nizhny Novgorod, March 10--13, 2020
Solids

Experimental determination of mechanical properties of the anode cell of an X-ray lithograph

N. A. Djuzhev, E. È. Gusev, A. A. Dedkova, D. A. Tovarnov, M. A. Makhiboroda

National Research University of Electronic Technology

Abstract: We have prepared the anode cell of an X-ray lithograph in the form of a PolySi/Si$_{3}$N$_{4}$/SiO$_{2}$ membrane structure using group technology. The design of the stand for determining mechanical properties of membranes has been modernized. The critical pressure of a membrane structure with a diameter 250 $\mu$m varies in the range from 0.484 to 0.56 MPa for 15 samples. The mechanical strength of the PolySi*/Si$_{3}$N$_{4}$/SiO$_{2}$ structure is 3.13 GPa. The new model in the Comsol package shows good correlation between the experimental critical pressure and the theoretical mechanical strength of the membrane. The distribution of mechanical stresses over the membrane has been obtained by simulation and analytic calculation. It is proved that the structure breaking region is localized at the membrane/substrate interface.

Keywords: mechanical strength, membranes, thin films, polycrystalline silicon, silicon oxide, silicon nitride.

Received: 02.04.2020
Revised: 02.04.2020
Accepted: 02.04.2020

DOI: 10.21883/JTF.2020.11.49971.107-20


 English version:
Technical Physics, 2020, 65:11, 1755–1759

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