Abstract:
We have prepared the anode cell of an X-ray lithograph in the form of a PolySi/Si$_{3}$N$_{4}$/SiO$_{2}$ membrane structure using group technology. The design of the stand for determining mechanical properties of membranes has been modernized. The critical pressure of a membrane structure with a diameter 250 $\mu$m varies in the range from 0.484 to 0.56 MPa for 15 samples. The mechanical strength of the PolySi*/Si$_{3}$N$_{4}$/SiO$_{2}$ structure is 3.13 GPa. The new model in the Comsol package shows good correlation between the experimental critical pressure and the theoretical mechanical strength of the membrane. The distribution of mechanical stresses over the membrane has been obtained by simulation and analytic calculation. It is proved that the structure breaking region is localized at the membrane/substrate interface.