Abstract:
The optical, mechanical, and thermal properties of freestanding films based on nitrided molybdenum and zirconium disilicides were investigated. It has been shown that nitriding of silicides leads to a significant increase in the thermal stability of the films. So, if crystallization of initially amorphous freestanding MoSi$_{2}$ or ZrSi$_{2}$ films is observed at temperatures of 330–370$^{\circ}$C, the introduction of nitrogen into the film makes it possible to increase the temperature up to 600–700$^{\circ}$Ñ at which MoSi$_{2}$N$_{x}$ and ZrSi$_{2}$N$_{y}$ (at least for $x\ge$ 0.25, $y\ge$ 1.3) films can be used for many hours when heated under vacuum. The study of mechanical tensile strength showed that the ultimate strength is weakly dependent on the nitrogen content in MoSi$_{2}$N$_{x}$ films (0 $\le x\le$ 0.55). Comparison of the properties of MoSi$_{2}$N$_{x}$ and ZrSi$_{2}$N$_{y}$ films obtained by the magnetron method at the same nitrogen partial pressure demonstrated that at similar values of the transmittance at 13.5 nm, nitrated ZrSi$_{2}$ films are more effective as protective coatings (less susceptible to oxidation and more resistant to degradation at high temperatures).
Keywords:freestanding thin films, extreme ultraviolet, nitrided films of molybdenum and zirconium disilicides, thermal stability, rupture pressure.