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Zhurnal Tekhnicheskoi Fiziki, 2019 Volume 89, Issue 11, Pages 1783–1788 (Mi jtf5475)

This article is cited in 3 papers

XXIII International Symposium on Nanophysics and Nanoelectronics, Nizhny Novgorod, March 11-14, 2019

Influence of thermal annealing on the properties of multilayer Mo/Be mirrors

R. M. Smertina, S. A. Garakhina, S. Yu. Zueva, A. N. Nechaia, V. N. Polkovnikova, N. N. Salashchenkoa, M. V. Svechnikova, M. G. Sertsub, A. Sokolovb, N. I. Chkhaloa, F. Schäfersb, P. A. Yunina

a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod
b Helmgoltz-Zentrum Berlin, Berlin, Germany

Abstract: The influence of thermal action on X-ray optics performance and structure of films and transition regions in multilayer Mo/Be mirrors optimized for a reflection maximum in the interval 11.2–11.4 nm at normal incidence has been considered. The annealing temperature reached 300$^{\circ}$C and the annealing time was 1 and 4 h. It has been shown that after thermal annealing in vacuum for 1 h at 300$^{\circ}$C, the reflection coefficient rises; however, when the annealing time grows to 4 h, it drops. Grains in molybdenum films become finer, and the profiles of transition regions change from exponential to linear. The period of multilayer mirrors has remained the same under all annealing conditions.

Received: 28.03.2019
Revised: 28.03.2019
Accepted: 15.04.2019

DOI: 10.21883/JTF.2019.11.48345.136-19


 English version:
Technical Physics, 2019, 64:11, 1692–1697

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