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Zhurnal Tekhnicheskoi Fiziki, 2019 Volume 89, Issue 10, Pages 1589–1591 (Mi jtf5498)

This article is cited in 8 papers

Solid-State Electronics

Electronic and optical properties of GaAlAs/GaAs thin films

B. E. Umirzakov, S. B. Donaev, N. M. Mustafaeva

Tashkent State Technical University named after Islam Karimov

Abstract: It is shown that the formation of GaAlAs nanofilms on the GaAs surface leads to an increase in the value of the emission coefficient of true secondary electrons and of the quantum yield of photoelectrons, which is explained by the difference in the depth of the exit zone of true secondary electrons for GaAs and GaAlAs.

Keywords: Emission properties, optical properties, nanofilm, ion implantation, GaAs films, nanocrystalline phases.

Received: 09.09.2017
Revised: 16.03.2018
Accepted: 01.03.2019

DOI: 10.21883/JTF.2019.10.48177.2475


 English version:
Technical Physics, 2019, 64:10, 1506–1508

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