Peculiarities of magnetron sputtering of nickel oxide thin films for use in perovskite solar cells

Use of inorganic oxides as transport layer material is a promising way to increase the efficiency of perovskite solar cells. Results of the studies of the influence of the gas mix composition in the plasma discharge used during magnetron sputtering on the optical, electrical, and structural parameters of deposited thin nickel oxide films are reported. Addition of oxygen or nitrogen to pure argon atmosphere (up to 30 vol %) was shown to change the growth rate (1.2–2.3 nm/min), resistivity of the samples (8.5–208 $\Omega$ cm), material band gap (2.85–3.43 eV), and the spectral dependence of the extinction coefficient, while the structural and morphological parameters of synthesized thin films were not affected. The lowest extinction coefficients were found in films deposited in pure argon atmosphere, which determines the capabilities of their usage in photovoltaic converters based on perovskite compounds.