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Zhurnal Tekhnicheskoi Fiziki, 2018 Volume 88, Issue 6, Pages 955–958 (Mi jtf5908)

This article is cited in 2 papers

Brief Communications

Influence of dopant incomplete ionization on the capacitance of a reverse-biased 4H-SiC $p^{+}$$i$$n^{+}$ diode

P. A. Ivanov, A. S. Potapov, I. V. Grekhov

Ioffe Institute, St. Petersburg

Abstract: The transient process in an $RC$ circuit with a reverse-biased 4H-SiC $p^{+}$$i$$n^{+}$ diode serving as a capacitor has been numerically simulated using the SILVACO TCAD software environment. The model experiment has shown that the charge time of an optimally designed 4H-SiC $p^{+}$$i$$n^{+}$ capacitor with dopant incomplete ionization is roughly an order of magnitude shorter than in the hypothetical case of complete ionization. The potential effect of the dopant ionization dynamics on the transient process has been found.

Received: 18.10.2017

DOI: 10.21883/JTF.2018.06.46031.2517


 English version:
Technical Physics, 2018, 63:6, 928–931

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