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Zhurnal Tekhnicheskoi Fiziki, 2016 Volume 86, Issue 1, Pages 61–69 (Mi jtf6656)

This article is cited in 1 paper

Plasma

Magnetron source of accelerated plasma flow

L. P. Veresov, O. L. Veresov

Sukhumi Institute of Physics and Technology

Abstract: A new source of an accelerated plasma flow intended for depositing high-quality coatings is described. In this source, a magnetron discharge for cathode target sputtering is combined with a high-voltage discharge with longitudinal oscillation of electrons for ionization of the accrued vapor in which the plasma density is distributed uniformly owing to the application of three-phase ionizer.

Keywords: Cathode Region, Plasma Accelerator, Vapor Fraction, Magnetron Discharge, Cathode Block.

Received: 16.02.2015
Revised: 15.06.2015


 English version:
Technical Physics, 2016, 61:1, 59–67

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© Steklov Math. Inst. of RAS, 2024