Ni-based multilayer structures for Goebel-type mirrors

In this work, the characteristics of the Ni$_{80}$Mo$_{20}$/Si multilayer structure, which is promising for the manufacture of Goebel mirrors, were studied for the first time. The structural parameters of the multilayer structure were determined. It is shown that the values of the transition regions for $\sigma$(Ni$_{80}$Mo$_{20}$) and $\sigma$(Si) are 5 and 8.5 $\mathring{\mathrm{A}}$, respectively. The composition of the structures was found at which the best reflectivity $R$ = 69.5–56.1% was achieved for periods of 41.5–32 $\mathring{\mathrm{A}}$.