The Maskless litographer of direct drawing. Design, structure and application

The article presents the results of the development the maskless litographer of direct drawing, which allows to form the “windows” in the photoresist layer by the beam with a diameter of 10 $\mu$m, with a moving accuracy of up to 2.5 $\mu$m and edge evenness of up to 10 $\mu$m. The technic structure of the lithographer and the operating principle of the main components of the device are described. Special software was developed to the lithographer control. The developed device was successfully tested for the range of technical goals, includes the making the multilayer multistrip X-ray mirrors.