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Zhurnal Tekhnicheskoi Fiziki, 2024 Volume 94, Issue 10, Pages 1713–1719 (Mi jtf6884)

Physics of nanostructures

Experimental study of the mechanism of relief formation in liquid photopolymerizing compositions

V. S. Solovieva, N. A. Raschepkinab, D. M. Yakunenkovac, A. E. Chalykhd

a National Research University of Electronic Technology
b Samara State Technical University
c Samara State Aerospace University
d Institute of Physical Chemistry and Electro Chemistry, Russian Academy of Sciences, Moscow

Abstract: A theoretical and experimental study of the mechanism of microrelief formation on layers of liquid photopolymerizing compositions was carried out. A direct experiment was carried out to prevent diffusion mass transfer during the post-exposure period. From the experiment it became clear that there is no diffusion of the liquid oligomer from dark to light zones during the post-exposure period. It is concluded that, due to the microheterogeneous mechanism of polymerization, the increase in relief during the post-exposure period is due to the swelling of polymer globules in their own remaining oligomer.

Keywords: liquid photopolymerizing compositions, microrelief, degree of conversion, microheterogeneous mechanism, radical polymerization

Received: 19.03.2024
Revised: 03.07.2024
Accepted: 04.07.2024

DOI: 10.61011/JTF.2024.10.58866.88-24



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© Steklov Math. Inst. of RAS, 2025