Abstract:
A theoretical and experimental study of the mechanism of microrelief formation on layers of liquid photopolymerizing compositions was carried out. A direct experiment was carried out to prevent diffusion mass transfer during the post-exposure period. From the experiment it became clear that there is no diffusion of the liquid oligomer from dark to light zones during the post-exposure period. It is concluded that, due to the microheterogeneous mechanism of polymerization, the increase in relief during the post-exposure period is due to the swelling of polymer globules in their own remaining oligomer.