A. Ya. Lopatin, V. I. Luchin, A. N. Nechai, A. A. Perekalov, A. E. Pestov, N. N. Salashchenko, A. A. Solov'ev, N. N. Tsybin, N. I. Chkhalo, “Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets”, Zhurnal Tekhnicheskoi Fiziki, 2023, Volume 93, Issue 7,Pages <nobr>892

XXVII International Symposium "Nanophysics and Nanoelectronics" N. Novgorod, March 13-16, 2023
Plasma

Emission characteristics of a laser-plasma source of extreme ultraviolet radiation with thin-film targets

A. Ya. Lopatin^a, V. I. Luchin^a, A. N. Nechai^a, A. A. Perekalov^a, A. E. Pestov^a, N. N. Salashchenko^a, A. A. Solov'ev^b, N. N. Tsybin^a, N. I. Chkhalo^a

^a Institute for Physics of Microstructures, Russian Academy of Sciences, Nizhny Novgorod, Russia
^b Institute of Applied Physics, Russian Academy of Sciences, 603950 Nizhny Novgorod, Russia

Abstract: The radiation spectra in the soft X-ray and extreme ultraviolet wavelength ranges of thin-film (0.15 $\mu$m) targets made of light materials (Si, C, Be) were studied when excited by a Nd:YAG laser pulse with a duration of 5.2 ns focused to an intensity of $\sim$10$^{12}$ W/cm$^2$. Line spectra of BeIII, BeIV, CV, and SiV ions were recorded using a spectrometer based on a multilayer X-ray mirror. A comparison with the spectra of bulk solid-state targets of the same materials is carried out. In all cases, there was a decrease in the intensity of the lines of the soft X-ray spectrum of film targets compared to monolithic ones; the decrease was, depending on the material, from several tens of percent to several times, with more than an order of magnitude less mass of the vaporized substance. Keywords:

Keywords: SXR and EUV radiation, thin films, laser plasma.

Received: 19.04.2023
Revised: 19.04.2023
Accepted: 19.04.2023

DOI: 10.21883/JTF.2023.07.55742.97-23