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Zhurnal Tekhnicheskoi Fiziki, 2023 Volume 93, Issue 7, Pages 1025–1031 (Mi jtf7045)

XXVII International Symposium "Nanophysics and Nanoelectronics" N. Novgorod, March 13-16, 2023
Physical Electronics

Silicon-on-insulator structures microtopography transformations features after photonic and corpuscular radiation exposure

B. A. Loginova, D. Yu. Blinnikovb, V. S. Vtorovab, V. V. Kirillovab, E. A. Lyashkob, V. S. Makeevb, A. R. Pervykhb, N. D. Abrosimovac, I. Yu. Zabavichevcd, A. S. Puzanovcd, E. V. Volkovad, E. A. Tarasovad, S. V. Obolenskycd

a Moscow State Institute of Electronic Technology (Technical University), 124498 Zelenograd, Russia
b University of Science and Technology "Sirius", 354349 Sochi, Russia
c Federal State Unitary Enterprise RFNC-VNIIEF, RFNC-VNIIEF Branch "Measuring Systems Research Institute named after Yu.Ye. Sedakov", 603950 Nizhny Novgorod, Russia
d National Research Lobachevsky State University of Nizhny Novgorod, 603600 Nizhny Novgorod, Russia

Abstract: The article presents the results of studies of microrelief parameters and electrophysical characteristics of “silicon on insulator” structures after exposure to gamma and gamma neutron radiation. Experimental studies were carried out using the methods of atomic force microscopy and pseudo-MOS transistor. On the basis of the data obtained, an estimate was made of the average size and area of the space charge of clusters of radiation defects.

Keywords: AFM, silicon on insulator, pseudo-MOS, “subthreshold” defect formation, radiation defects clusters.

Received: 04.05.2023
Revised: 04.05.2023
Accepted: 04.05.2023

DOI: 10.21883/JTF.2023.07.55764.91-23



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