Comment to the paper by A.I. Tolmachev and L. Forlano “Depemdence of the sputtering yield on the angle of ion incidence on the target surface” (2022, V. 92. Issue 5. P. 660–664)
Abstract:
A criitical analysis of the approach applied by A.I. Tolmachev and L. Forlano (ZhTF, 92 (5), 660 (2022)) to solving the problem of ion sputtering of solids is presented.
Keywords:sputtering, angular dependence of the sputtering yield, computer simulation, program PAOLA, program SRIM, transport equation, binary collisions.
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