Dependence of the sputtering yield on the angle of ion incidence on the target surface

We investigated the behavior of sputtering yield for oblique angles of ion incidence on the target surface. The range of incidence angles varied from 0$^\circ$ (normal incidence) to almost 90$^\circ$ (limiting grazing incidence). Computer simulation was performed by the program PAOLA. Theoretical analysis included numerical solution of the Chandrasekhar integral equation. The results obtained are compared with the results of other authors