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Zhurnal Tekhnicheskoi Fiziki, 2022 Volume 92, Issue 8, Pages 1172–1178 (Mi jtf7412)

This article is cited in 1 paper

XXVI International Symposium "Nanophysics and nanoelectronics", N.Novgorod, 14 - 17 March 2022
Physics of Nanostructures

Formation of inhomogeneous oxide and suboxide layers on an ultra-thin metal film by multiple oxidation and ion sputtering

A. V. Lubenchenkoa, D. A. Ivanova, O. I. Lubenchenkoa, A. B. Pavolotskyb, D. S. Lukyantseva, V. A. Iachuka, O. N. Pavlova

a National Research University "Moscow Power Engineering Institute", 111250 Moscow, Russia
b Chalmers University of Technology, 41296 Göteborg, Sweden

Abstract: A technique of controlled formation of multilayer oxide and suboxide layers on a thin metal film. An opportunity of controlled generation of films containing an ultra-thin suboxide layer inside a higher oxide layer and films being a periodic layered structure with alternating oxide layers of various oxidation levels. A structure containing alternating ultra-thin layers of higher oxide and suboxide layers on a niobium film.

Keywords: metal-oxide films, controlled film formation, layer chemical and phase profiling, X-ray photoelectron spectroscopy.

Received: 30.03.2022
Revised: 30.03.2022
Accepted: 30.03.2022

DOI: 10.21883/JTF.2022.08.52779.68-22



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