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Zhurnal Tekhnicheskoi Fiziki, 2025 Volume 95, Issue 3, Pages 615–621 (Mi jtf7532)

Special issue on the materials of the International Conference "Nanocarbon and Diamond" (NiA'2024)
Physical electronics

Modification of the structural properties of niobium thin films after hydrogenation

Yu. A. Salamatov, D. I. Devyaterikov, M. V. Makarova, V. V. Matyukhov, Yu. S. Ponosov, V. V. Proglyado, E. A. Tolmacheva, E. A. Kravtsov

Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences, Yekaterinburg, Russia

Abstract: The relationships between the concentration of hydrogen absorbed in thin films of Al$_2$O$_3$//Nb type and the structural properties of these films have been established. The main research methods were X-ray diffraction and reflectometry. Structural changes after hydrogenation processes at various temperatures are analyzed. The hydrogenation conditions under which solid solutions of hydrogen in niobium and/or niobium hydrides are formed are specified. It is shown that it is possible to additionally control the concentration of hydrogen in niobium by applying a graphene layer to the film surface, obtaining an Al$_2$O$_3$//Nb/Gr type system. Being a kind of “anticatalytic layer”, graphene significantly slows down the penetration of hydrogen into the sample, which makes it possible to obtain the necessary concentrations with high accuracy.

Keywords: X-ray diffractometry, X-ray reflectometry, graphene, chemical vapor deposition, niobium hydrides, Raman spectroscopy.

Received: 25.10.2024
Revised: 25.10.2024
Accepted: 25.10.2024

DOI: 10.61011/JTF.2025.03.59869.360-24



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© Steklov Math. Inst. of RAS, 2025