Abstract:
The effect of thermomagnetic treatment on the structure and magnetic properties of films containing Ni layers in the vicinity of Ta layers or antiferromagnetic FeMn layer has been studied. It is shown that annealing at temperatures up to 300$^\circ$C significantly affects the nature of induced anisotropy in the ferromagnetic layer, which leads to variations in the anisotropy of the coercive force in Ta/Ni films or the anisotropy of the exchange bias field in FeMn/Ni films. Annealing at a higher temperature causes uneven interlayer diffusion of elements, which, according to profile X-ray fluorescence analysis, extends to a depth of at least 5 nm. This is accompanied by a sharp increase in the coercive force for Ta/Ni films and an increase in the resulting magnetization for FeMn/Ni films while maintaining the effect of exchange bias in them.