Z. È. Мuhtarov, Z. A. Isakhanov, B. E. Umirzakov, T. Kodirov, E. S. Ergashev, “Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface”, Zhurnal Tekhnicheskoi Fiziki, 2015, Volume 85, Issue 12,Pages <nobr>146

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Effect of implantation of active metal ions on the elemental and chemical compositions of the CdTe surface

Z. È. Мuhtarov^a, Z. A. Isakhanov^a, B. E. Umirzakov^a, T. Kodirov^a, E. S. Ergashev^b

^a Institute of Ion-Plasma and Laser Technologies, Uzbekistan Academy of Sciences, Tashkent
^b Tashkent State Technical University named after Islam Karimov

Abstract: We study the effect of bombardment with Ar$^+$ and Ba$^+$ ions on the composition and electron structure of the CdTe film surface. The optimal ion implantation and annealing regimes for obtaining a nanofilm of the Cd$_{0.5}$Ва$_{0.5}$Te type are determined. It is found that the value of $E_g$ of the three-component film decreases from 1.9 to 1.7 eV upon an increase in its thickness from 20 to 40 nm.

Received: 20.03.2015