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Zhurnal Tekhnicheskoi Fiziki, 2014 Volume 84, Issue 7, Pages 62–66 (Mi jtf8138)

This article is cited in 1 paper

Physical science of materials

Method for the formation of graphene films

E. A. Il'ichev, E. P. Kirilenko, G. N. Petrukhin, G. S. Rychkov, O. A. Sakharov, Z. M. Khamdokhov, E. Z. Khamdolhov, E. S. Chernyavskaya, M. L. Shupegin, A. A. Shchekin

State Research Institute of Physical Problems

Abstract: A method is proposed to form graphene films using thermodiffusion of carbon atoms from an amorphous carbon or silicon-carbon film with a nanosized thickness through a catalyst film, their accumulation at the catalyst layer/barrier layer interface, and the subsequent carbon quasi-liquid-graphene phase transition. One of the advantages of this method of producing graphene films is the possibility of their formation directly on a dielectric layer and the subsequent suspension of a graphene film over the substrate surface using membrane technologies, which excludes the necessity of using complex procedures to separate a graphene film from the substrate.

Received: 04.07.2013


 English version:
Technical Physics, 2014, 59:7, 1007–1011

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