Simulation of the UV lamp source based on the longitudinal repetitively pulsed discharge in the Xe–CsCl mixture

An original kinetic model is used to simulate the characteristics of the XeCl exciplex UV source based on the mixture of Xe and CsCl vapor that is excited using the longitudinal repetitively pulsed discharge. The dependences of the radiation power and excitation efficiency of the XeCl exciplex molecules on the xenon and CsCl concentrations and the excitation pulse repetition rate are obtained. The calculated results are compared with the experimental data. The reasons for the limitations of the output radiation powers of the working mixture are discussed.