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Zhurnal Tekhnicheskoi Fiziki, 2013 Volume 83, Issue 11, Pages 142–145 (Mi jtf8627)

This article is cited in 1 paper

Brief Communications

Effect of the deposition parameters on the structure and physicochemical properties of protective Al$_2$O$_3$ coatings

A. D. Pogrebnyaka, F. F. Komarovb, A. Sh. Kaverinaa, O. V. Sobol'c, Yu. N. Tyurind, A. I. Kupchishine, M. K. Kylyshkanovf

a Sumy State University
b Belarusian State University, Minsk
c Khar'kov Polytechnical University
d E. O. Paton Electric Welding Institute, National Academy of Sciences of Ukraine
e Kazakh National Pedagogical University
f East Kazakhstan State Technical University named after D. Serikbayev, Ust-Kamenogorsk

Abstract: Three series of Al$_2$O$_3$ coating samples are fabricated by microarc oxidation under various deposition conditions and are studied by scanning electron microscopy (SEM) in combination with energy-dispersive x-ray spectroscopy (EDXS), Rutherford backscattering, and X-ray diffraction. Defects and pores in the coatings are analyzed by positron annihilation spectroscopy at room temperature without vacuum. No nanometer pores are detected in the coatings. When changing the electrolyte-plasma oxidation conditions, one can change the concentration and the ratio of the types of vacancy defects in these Al$_2$O$_3$ coatings.

Received: 10.10.2012
Accepted: 29.01.2013


 English version:
Technical Physics, 2013, 58:11, 1688–1691

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