Accumulation of hydrogen by silicon powders in HF inductive discharge plasma

The possibility of saturation with hydrogen of micro- and nanostructured silicon powders in electrodeless plasma is demonstrated. It is established that the hydrogen concentration in the bulk of the powder is determined by the size of its particles, the hydrogen pressure in the reaction chamber, and the HF power. The mechanism of plasma saturation with hydrogen is based on the chemical interaction of hydrogen atoms and active radicals with the surface of particles of the silicon powder, which is a surface with a distorted order of stacking of silicon atoms.