Properties of low-refractive-index films obtained by the close-spaced vapor transport technique under the sublimation of graphite in a quasi-closed volume

The properties of low-refractive-index carbon films obtained by close-spaced vapor transport at graphite sublimation are studied. The optical properties of the films are investigated by monochromatic multiple-angle ellipsometry, and their morphology is examined by AFM. It is found that the films have a columnar structure with a background surface roughness of about 1 nm. In addition, the surface of the film contains islands up to 50 nm in height with a footprint of $\approx$ 200 nm. A low-refractive-index carbon film deposited by close-spaced vapor transport on silicon tips is found to decrease the field emission threshold and drastically raise the current.