M. S. Rubina, A. V. Budnikov, I. V. Elmanovich, I. O. Volkov, A. Yu. Vasil'kov, “Effect of low-pressure radio-frequency air plasma on chitosan films”, Mendeleev Commun., 2022, Volume 32, Issue 2,Pages <nobr>283

This article is cited in 1 paper

Communications

Effect of low-pressure radio-frequency air plasma on chitosan films

M. S. Rubina, A. V. Budnikov, I. V. Elmanovich, I. O. Volkov, A. Yu. Vasil'kov

A.N. Nesmeyanov Institute of Organoelement Compounds of Russian Academy of Sciences, Moscow, Russian Federation

Abstract: The effect of low-frequency (15 kHz), low-pressure (10 Pa) air plasma treatment on freshly prepared chitosan films at processing times from 3 to 10 min has been explored. The films were prepared using chitosan solutions in dilute acetic acid. The influence of the plasma exposure time on the composition, morphology, and hydrophilic properties of the film surfaces is discussed.

Keywords: chitosan films, plasma treatment, AFM, roughness, wettability.

Language: English

DOI: 10.1016/j.mencom.2022.03.044

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