Abstract:
Tungsten selenide (WSe$_2$) film was successfully deposited on FTO substrate by brush plating technique. The film was uniform and well adherent to the substrate and annealed to 300$^\circ$ C and 500$^\circ$ C. As the annealing temperature was increased the orientation of the crystallites was more randomized than in the as-prepared film. The structural and optical properties of the film were investigated by XRD, SEM, EDAX, UV-Visible and PL. The XRD pattern indicates that this film was crystallized in the hexagonal structure.