Abstract:
Copper oxide is a narrow band gap, low cost, nontoxic, photoactive metal oxide and can be considered as the best candidate for photo- electrochemical applications. Thin films of p-type copper oxide are prepared by cyclic voltammetric technique. The electrochemical method is a cost effective low temperature technique for the preparation of functional thin films. Tools like, GIXRD, Raman Spectroscopy, UV-Vis Spectroscopy, PL, SEM and EIS analysis are done to study the structure, phase, optical, morphological and electrochemical behavior of the copper oxide thin film. The effect of deposition conditions on the electrical and optical properties of the thin films are analyzed in detail.