V. A. Kiselevskii, K. A. Fetisenkova, A. A. Tatarintsev, A. E. Mel'nikov, O. G. Glaz, “Optimization of technologies for manufacturing integrated photonics structures using positive electron resist AR-P 6200”, Optics and Spectroscopy, 2025, Volume 133, Issue 3,Pages <nobr>292

Proceedings of The XXVIII Annual International Conference "Saratov Fall Meeting 2024", September 23-27, 2024, Saratov, Russia. Advanced materials in optoelectronics, laser physics, and photonics
Fiber and integrated optics

Optimization of technologies for manufacturing integrated photonics structures using positive electron resist AR-P 6200

V. A. Kiselevskii^ab, K. A. Fetisenkova^bc, A. A. Tatarintsev^b, A. E. Mel'nikov^b, O. G. Glaz^bd

^a V. G. Mokerov Institute of Ultra High Frequency Semiconductor Electronics of RAS, Moscow
^b Valiev Institute of Physics and Technology of Russian Academy of Sciences
^c Moscow Institute of Physics and Technology (State University), Dolgoprudny, Moscow region
^d National Research University "Moscow Power Engineering Institute"

Abstract: A method for manufacturing waveguides with a channel of a given width using electron-beam lithography with the application of positive electron resist AR-P 6200 (CSAR 62) was developed. A technological process with selected parameters was found, which made it possible to manufacture test structures of integrated photonics.

Keywords: fiber optics, electron beam lithography, reactive-ion etching, positive electron resist.

Received: 29.10.2024
Revised: 17.12.2024
Accepted: 28.02.2025

DOI: 10.61011/OS.2025.03.60246.2-25