Electrophysical properties of dielectric sol-gel coatings based on silica dioxide

The compositions have been determined and a series of film-forming solutions has been prepared to study the effect of the methyltriethoxysilane concentration in tetraethylorthosilicate-based solutions on the electrical properties. The optimal modes of deposition and heat treatment of film-forming solutions for the synthesis of dielectric sol-gel coatings have been selected experimentally. The viscosity of the resulting solutions has been studied using a capillary viscometer. The studies of cleavage were carried out using a scanning electron microscope to analyze the thickness and homogeneity of the structure of the obtained materials. The capacitance-voltage and current-voltage dependences have been established. The calculations of the dielectric constant, the value of the voltage shift of the flat zones and the capacitance of the flat zones have been performed.